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Increased Productivity and Higher, Best-in-Class Yields

The TurboDisc® K465i™ HP™ GaN MOCVD System features a high performance reactor designed to increase within-wafer wavelength uniformity by up to 20%.  The K465i HP MOCVD system is based on the production-proven K465i MOCVD system platform and provides higher productivity for HB-LED high-volume production fabs around the globe.  This system achieves superior uniformity and excellent run-to-run repeatability.  It also offers high productivity due to its full automation and shortened recovery period after maintenance.  The K465i HP MOCVD system is field upgradeable from the industry-leading K465i MOCVD system.

Up to 20% increase in within-wafer wavelength uniformity compared to K465i MOCVD system for highest productivity and best-in-class yields. Based on production-proven, high throughput K465i MOCVD platform. Incorporates new Uniform FlowFlange® gas distribution system technology for highest within-wafer uniformity and ultimate process repeatability. Simplified design provides ease of tuning for fast production qualification and fast recovery after maintenance. Low maintenance TurboDisc high velocity laminar flow technology enables highest system availability. Low cost of ownership for maximum profitability.

TurboDisc K465i HP GaN MOCVD System