Omscientific is a representative of Semicore in India.
PROCESS CONTROL: Integrated computer control with recipe based operation.
MONITORING: Crystal monitoring, optical monitoring and special data gathering software for in-situ measurement of film deposition.
GAS AND PRESSURE CONTROL: Single or multi MFC gas channels, dymanic pressure control.
ION SOURCE: Pre-cleaning, IBAD - assisted deposition, milling.
Impel PVD Features and Options:
Up to three independent process chambers, 16 or 24 inch diameter, stainless steel - scaled to match the specific application.Rear chamber access door for service and maintenance.
ALUMINUM DOOR WITH VIEWPORT: (standard)
PUMPING: Turbomolecular or cryogenic.
LOAD LOCK: Manual or automatic transfer, high vacuum pumping, various substrate sizes and shapes up to 200 mm.
Impel PVD - Multi-Chamber Deposition System