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Omscientific is a representative of Semicore in India.

PROCESS CONTROL: Integrated computer control with recipe based operation.

MONITORING: Crystal monitoring, optical monitoring and special data gathering software for in-situ measurement of film deposition.

GAS AND PRESSURE CONTROL: Single or multi MFC gas channels, dymanic pressure control.

ION SOURCE: Pre-cleaning, IBAD - assisted deposition, milling.

​​​Impel PVD Features and Options:

VACUUM CHAMBER:

Up to three independent process chambers, 16 or 24 inch diameter, stainless steel - scaled to match the specific application.Rear chamber access door for service and maintenance.

ALUMINUM DOOR WITH VIEWPORT: (standard)

​PUMPING: Turbomolecular or cryogenic.

LOAD LOCK: Manual or automatic transfer, high vacuum pumping, various substrate sizes and shapes up to 200 mm.

Impel PVD - Multi-Chamber Deposition System